Metrohm 797 VA Computrace Bedienungsanleitung PDF herunterladen (Seite 214)

7 Manual control

797 VA Computrace – Software

202

Plating solution [ 48 characters ; ]

Name of electrolyte solution used for film deposition.

Stirrer/RDE (rpm) [ 0...3000 rpm ; 2000 rpm ]

Revolutions per minute of the rotating disk electrode. The

stirring of the RDE remains active during all preparation pro-

cedure steps until the start of the cleaning sweep.

Purge time (s) [ 0...80600 s ; 300 s ]

Time of inert gas purging before the first measurement of the

sample solution.

Conditioning cycles

Before deposition, the solid state electrode can be electro-

chemically regenerated by a freely selectable number of con-

ditioning cycles. For every cycle, the voltage is changed at a

sweep rate of 1 V/s to the

End potential and then decreased

at the same rate back to the Start potential.

Start potential (V) [ -5...+5 V ; -1.2 V ]

Start voltage for the cyclic conditioning sweep.

End potential (V) [ -5...+5 V ; -0.1 V ]

Final voltage for the cyclic conditioning sweep.

No. of cycles [ 0...X ; 0 ]

Number of conditioning cycles.

Deposition potential (V) [ -5...+5 V ; -0.8 V ]

Voltage applied to the electrodes during the Deposition time.

Deposition time (s) [ 0...80600 s ; 10 s ]

Time during which the Deposition potential is applied to the

electrodes.

Cleaning potential (V) [ -5...+5 V ; -0.05 V ]

Voltage applied to the electrodes during the Cleaning time.

Cleaning time (s) [ 0...80600 s ; 10 s ]

Time during which the Cleaning potential is applied to the

electrodes.

1 2 ... 209 210 211 212 213 214 215 216 217 218 219 ... 294 295

Keine Kommentare

Metrohm 797 VA Computrace Bedienungsanleitung Seite 214